Locations

Corporate Research & Development Center(* 1), Corporate Digital Innovation Technology Center(* 2), and Corporate Manufacturing Engineering Center(* 3) handle the research and development for the entire Toshiba Group. In addition, we are expanding our research and development facilities in America, Europe, China, India, and Vietnam. The Toshiba Group's engineering development facilities work hand-in-hand, in Japan and overseas, to achieve far-reaching breakthrough research and development on a global stage.

Japan - Laboratories

* When you click on each offices, a popup window will be displayed.

Yokohama and Isogo Area
  • Corporate Manufacturing Engineering Center(* 3)
    Electronic Devices &Storage Research & Development Center
Yokohama and Shinsugita Area
  • Energy Systems Research and Development Center
Yokohama Complex and Keihin Complex
  • Energy Systems Research and Development Center
Fuchu Area
  • Energy Systems Research and Development Center
    Infrastructure Systems Research and Development Center
    Software Systems Research and Development Center
Kawasaki and Komukai Area
  • Corporate Research & Development Center(* 1)
  • Digital Innovation Technology Center(* 2)
  • Infrastructure Systems Research and Development Center
    Electronic Devices & Storage Research & Development Center
Kawasaki and Hamakawasaki Area
  • Energy Systems Research and Development Center
Kawasaki and Ukishima Area
  • Energy Systems Research and Development Center

Global - Laboratories

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  • Toshiba China R & D Center(* 1)
(* 1)This is the locations related to Corporate Research & Development Center.
(* 2)This is the locations related to Corporate Digital Innovation Technology Center.
(* 3)This is the locations related to Corporate Manufacturing Engineering Center.
(* 1)This is the locations related to Corporate Research & Development Center.
(* 2)This is the locations related to Corporate Digital Innovation Technology Center.
(* 3)This is the locations related to Corporate Manufacturing Engineering Center.