Toshiba Corporate Manufacturing Engineering Center

Core Manufacturing Technology

Material and device processes technology

We are committed to the R&D of processing, reaction control, and analysis technologies, aiming to improve production efficiency and develop new technologies for nanoscale to meter-sized structures, devices, and systems, based on the understanding of mechanisms.

[Image] Material and device processes technology

Process, analysis and simulation

We are promoting the R&D of various processes, materials, analysis, and simulation technologies, in order to early mass production and productivity improvement of products such as manufacture energy, infrastructure, and electronic systems and devices. Our R&D efforts also include unique process technologies such as for the fabrication of multifunctional nanofiber films and their application to products and digitization of manufacturing processes.

[Image] Multifunctional nanofiber membrane formed by electrospinning

Multifunctional nanofiber membrane formed by electrospinning

[Image] Microfabrication by atomic layer etching

Microfabrication by atomic layer etching

[Image] Simulation and machine learning of drying phenomena

Simulation and machine learning of drying phenomena

[Image] Surface preparation by development chemical

Surface preparation by development chemical

Process applications and new devices

Drawing on our many technologies and expertise relating to coating processes, vacuum processes, chemical processes, fluid control and more, we design and manufacture prototype equipment and analyze and evaluate it using the latest measurement and simulation technologies to improve process performance and reduce costs.
We also propose concepts for new devices, perform basic design, and conduct prototyping trials with the aim of launching new products.

[Image] 3D-oriented collagen nanofiber sheets

3D-oriented collagen nanofiber sheets

[Image] Applications for the SCiBTM manufacturing process

Applications for the SCiB™ manufacturing process

[Image] Simulation and measurement of power semiconductor device characteristics

Simulation and measurement of power semiconductor device characteristics

[Image] Coating to reduce the amount of materials required by high-viscosity inkjet heads

Coating to reduce the amount of materials required by high-viscosity inkjet heads